実験装置

Thin Film Deposition

Facing Targets Sputtering
Facing taret sputtering (FTS)

High-rate sputtering (approx. 80 nm/min) for a-Si and a-Si:H with ultra-low damage.

PECVD
DC sputtering
SEM
Thermal evaporation
XRD
Close space sublimation

Characterization

Facing Targets Sputtering
Spectroscopic ellipsometry
PECVD
IV measurement system under AM1.5G
SEM
IV measurement system under blue laser
XRD
Hall measurement system